Nanoscale applications in energy, optics and medicine
have enhanced performance with nano-shaped structures. Such
architectures can be fabricated at high-throughput beyond the
capabilities of advanced optical lithography. In a new report on
Microsystems & Nanoengineering, Anushman Cherala and a research
team at the University of Texas at Austin Texas, U.S., expanded on
nanoimprint lithography and extended the previous simulation
framework to improve shape retention by varying the resist formula
and introducing new bridge structures during nanoshape imprinting.
The simulation study demonstrated viable approaches for nanoshaped
imprinting with good shape retention matched by experimental
data.
Nanoshape imprint lithography using molecular dynamics of
polymer crosslinking
