NewsTeam uses laser-induced graphene process to create
micron-scale patterns in photoresist

6th May 2021by admin0
https://nfusion-tech.com/wp-content/uploads/2021/05/team-uses-laser-induced-graphene-process-to-createmicron-scale-patterns-in-photoresist_60950e516e37d.jpeg

A Rice University laboratory has adapted its
laser-induced graphene technique to make high-resolution,
micron-scale patterns of the conductive material for consumer
electronics and other applications.

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      New Fusion

      The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

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