NewsResearchers develop new atomic layer deposition
process

27th October 2020by admin0
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A new way to deposit thin layers of atoms as a coating
onto a substrate material at near room temperatures has been
invented at The University of Alabama in Huntsville (UAH), a part
of the University of Alabama System.

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    The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

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      New Fusion

      The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

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