Researchers develop new atomic layer deposition
process

27th October 2020by admin0

A new way to deposit thin layers of atoms as a coating
onto a substrate material at near room temperatures has been
invented at The University of Alabama in Huntsville (UAH), a part
of the University of Alabama System.

Leave a Reply

Your email address will not be published. Required fields are marked *

https://nfusion-tech.com/wp-content/uploads/2019/10/Logo_newfusion-footer.png
https://nfusion-tech.com/wp-content/uploads/2019/10/Logo_newfusion-footer.png
Subscribe

If you wish to receive our latest news in your email box, just subscribe to our newsletter. We won’t spam you, we promise!

    New Fusion

    The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

    Subscribe

    If you wish to receive our latest news in your email box, just subscribe to our newsletter. We won’t spam you, we promise!

      New Fusion

      The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

      Copyright ©2024 New Fusion All Rights Reserved

      Designed by FallingBrick