A Korean research team has developed a technology to
fabricate an ultrathin material for electromagnetic interference
(EMI) shielding. The research team, led by Koo Chong-Min, the head
of the Materials Architecturing Research Center at the Korea
Institute of Science and Technology (KIST, Acting President Yoon
Seok-jin), announced that it had developed an ultrathin
nanometer-thick film using MXene, a new two-dimensional
nanomaterial for EMI shielding. The research was jointly conducted
with a team led by Professor Kim Sang-ouk of the Department of
Materials Science and Engineering at Korea Advanced Institute of
Science and Technology (KAIST, President: Shin Sung-chul) and a
research team led by Professor Yury Gogotsi from Drexel
University.