Patterning silicon at the one-nanometer scale

Researchers have developed an innovative technique for
creating nanomaterials. These are materials only atoms wide. They
draw on nanoscience to allow scientists to control their
construction and behavior. The new electron beam nanofabrication
technique, plasmon engineering, achieves unprecedented near-atomic
scale control of patterning in silicon. Structures built using this
approach produce record-high tuning of electro-optical
properties.