NewsNovel photoresist enables 3-D printing of smallest porous
structures

16th September 2020by admin0
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Researchers of Karlsruhe Institute of Technology (KIT)
and Heidelberg University have developed a photoresist for
two-photon microprinting. It has now been used for the first time
to produce three-dimensional polymer microstructures with cavities
in the nano range. In Advanced Materials, the scientists report how
porosity can be controlled during printing and how this affects
light scattering properties of the microstructures.

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The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

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