Researchers of Karlsruhe Institute of Technology (KIT)
and Heidelberg University have developed a photoresist for
two-photon microprinting. It has now been used for the first time
to produce three-dimensional polymer microstructures with cavities
in the nano range. In Advanced Materials, the scientists report how
porosity can be controlled during printing and how this affects
light scattering properties of the microstructures.
Novel photoresist enables 3-D printing of smallest porous
structures
