NewsNew microscopy under ambient achieves less than 10 nm
spatial resolution on surface potential measurement

24th June 2020by admin0
https://nfusion-tech.com/wp-content/uploads/2020/06/new-microscopy-under-ambient-achieves-less-than-10-nmspatial-resolution-on-surface-potential-measurement_5ef45e30ef620.jpeg

A new nanomaterials microscopy approach called Pulsed
Force Kelvin Probe Force Microscopy (PF-KPFM), allows for less than
10 nanometer measurements of work function and surface potential in
a single-pass AFM scan. The findings have been published in two
related articles in ACS Nano and Angewandte Chemie International
Edition.

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      The New Fusion technology is based on a phenomenon called triplet-triplet annihilation (TTA) which is a process in which two triplet excitons annihilate and produce a higher energy singlet exciton.

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