By varying the energy and dose of tightly focused
electron beams, researchers have demonstrated the ability to both
etch away and deposit high-resolution nanoscale patterns on
two-dimensional layers of graphene oxide. The 3-D
additive/subtractive “sculpting” can be done without changing the
chemistry of the electron beam deposition chamber, providing the
foundation for building a new generation of nanoscale
structures.
E-beam atomic-scale 3-D ‘sculpting’ could enable new quantum
nanodevices
